Evonik Coating Additives introduces TEGO Dispers 695, a novel hyperdispersant for radiation-curing inks and solventborne polyurethane inks. This innovative solution sets a new performance benchmark for pigment dispersion and formulation stability.

TEGO Dispers 695 ensures shorter grinding times, strong viscosity reduction, fine particle size, and ultimate color strength, even for demanding organic pigments – all while maintaining stability during storage.

The additive is highly polymeric, solvent-free, and 100% active, dissolving easily in a wide range of monomers and organic solvents, including alcohols. It enables formulators to achieve higher pigment loadings without thixotropy, reduced grinding times, and enhanced color strength across radiation-curing flexo, litho, and inkjet inks as well as PU-based solventborne inks. Suitable for all types of organic and inorganic pigments, TEGO Dispers 695 is the go-to choice for outperforming, next-generation ink formulations.

“Our TEGO Dispers 695 is not just an incremental improvement compared to other dispersing additives – it’s a significant technological leap,” said Susanne Struck, Global Head of Market Segment Printing Inks at Evonik Coating Additives. “Developed in close collaboration with our customers worldwide, it delivers unmatched performance.”